Techcet
Forecasts $1.5B in Photoresists for 2012
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In e-beam lithography, the negatively charged electron is used to communicate patterning information into the photoresist, rather than light. This allows certain advantages and comes with additional challenges over photo lithography in so far as resist design is concerned [1]
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A field that has begun to be explored is the application of nanocompsite materials as photoresists. The result has been a diversity of materials with high chemical and or plasma etch resistance, good resolution and transparency that have been developed for each lithographic wavelength.
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A photoresist absorbs some of the light it is exposed to for
driving the photochemical process in the film.
If the film absorbs all of the light, then the sidewalls of the
resulting nanostructure formed in the photoresist are sloped, due to the change
in light intensity through thickness and the varying response of the resist to
differing light intensities (the contrast curve of the resist). Thus, to avoid this defect (sloped
sidewalls), the resist is typically engineered to be rather transparent to the
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Message Board (1)
Well, if I am #1 in litho,
Well, if I am #1 in litho, what does it mean? How much time since this activity have started? Ara, can you comment?